Used TEL / TOKYO ELECTRON MARK Vz #9148316 for sale

TEL / TOKYO ELECTRON MARK Vz is a state-of-the-art photoresist equipment developed to support various processes in the semiconductor manufacturing industry. The system is designed to provide improved process control and improved film uniformity for a variety of production steps, and supports both the traditional spin-coat unit and the new self-aligning laser beam smoothing machine. The spin-coat sub-tool includes an integrated electrostatic motor chamber, a spin-coat applicator and spray nozzle, and a closed loop back-end wafer monitoring asset with precise contouring capability. The model also includes edge bead removal equipment for edge bead removal prior to wafer spin-coating. The system is capable of providing detailed information about each wafer's condition and uniformity during the spin-coat process, allowing for improved uniformity and better control over wafer step heights. The laser beam smoothing sub-unit uses a pair of self-aligning, super-high power lasers to smooth out surface topography on semiconductor wafers. This allows for the removal of non-uniformity and other out-of-specifies wafer features that traditional methods would be unable to reach. The machine also provides high-speed measurement of wafer thickness. TEL MARK-VZ is capable of processing 10-inch and 12 inch wafers at speeds of up to 4 micron/half-cycle. It can achieve a maximum sample rate of 200 notches per hour, including line edge roughness measurements. Furthermore, the tool is compatible with leading edge facilities such as: wet and dry etching chambers, rapid thermal processing reactors, high temperature furnaces, and much more. In conclusion, TOKYO ELECTRON MARK V-Z is an advanced and reliable photoresist asset designed to support various processes in the semiconductor manufacturing industry. It provides improved process control and uniformity for both spin-coat and laser beam smoothing processes, with hands-on control over important parameters such as wafer thickness and line edge roughness.