Used TEL / TOKYO ELECTRON MARK Vz #9205494 for sale

TEL / TOKYO ELECTRON MARK Vz photoresist equipment is a lithography solution that enables large-scale integration of precise micron-scale features. The system is suitable for use in advanced wafer and device fabrication facilities, and is capable of reliably patterning large-aspect-ratio features with excellent registration alignment. TEL MARK-VZ unit is designed to meet the requirements for advanced wafer design and fabrication. The machine is adept at delivering applications on silicon wafers, Si-LDI (silicon layer direct imaging) and compound materials with superior speed and accuracy. In operation, TOKYO ELECTRON MARK V-Z photoresist tool consists of a dedicated scanning stage, a scanner and a photoresist processor. The scanning stage is composed of two cubic vertical stages, a hexapod alignment stage and a multi-segment stage. The stage configuration is designed to optimize layout and positioning accuracy during the scanning, allowing efficient overlay between the PMOS and NMOS structures. TEL MARK Vz photoresist asset is equipped with a laser diode-source scanner that can pattern large-scale high-definition images in a single stroke. The scanner uses high-power laser beams to accurately pattern large-aspect-ratio features on patterned substrates. The scanner offers ultra-precise, distortion-free exposure, providing exceptionally clean and uniform images. TEL MARK V-Z photoresist model also features a processor that offers excellent chemical accuracy for wet and dry development. The processor is designed to provide consistent data and high sensitivity for processing of difficult-to-develop substrates. The processor is also capable of delivering post-exposure bakes (PEB) levels and advanced lithography algorithms. TOKYO ELECTRON MARK Vz photoresist equipment is ideal for use in advanced technological environments where extremely precise features are needed. It offers a cost-effective solution for pro ton and electron beam lithography to enable high-quality patterning for a variety of processes. In addition, it is available in a range of configurations to suit customers' specific needs.