Used TEL / TOKYO ELECTRON MARK Vz #9206244 for sale

TEL / TOKYO ELECTRON MARK Vz
ID: 9206244
Wafer Size: 2"
Track, 2".
TEL / TOKYO ELECTRON MARK Vz is a photoresist equipment that offers a complete range of solutions for high precision and high accuracy photolithography processing. The system features a highly-accurate nano-imprinting technology for creating advanced patterns on various substrates, such as silicon wafers, glass and plastic. The unit offers reproducible layers with excellent topography, while maintaining a high throughput rate. The machine is capable of providing a wide range of exposure parameters, thus enabling customers to apply the exposure parameters that are best suited for their specific process requirements. The tool's advanced imaging capability allows users to obtain precise images with no distortion from photoresist. It is further equipped with the latest optical imaging asset and accurate analysis capability to determine surface characteristics accurately. It also features precise production control systems, including online defect inspection and automatic process optimization software, making it more efficient and flexible production model. The equipment can be used to produce complex patterns in multiple layers and multiple sizes. It is also capable of creating critical components with high tolerance and repeatability. It further features a fast photo-imprinting process with short-term sample handling time and low power consumption. The system is powered by a combination of automated functions like calibration, indexing, image centering, reticle hold, edge point detection, program editing and data transmission. Additionally, the unit is equipped with advanced hardware to protect the performance levels of the photoreticles from radiation, fluctuations in temperature and dust particles. The machine is also equipped with a precision image positioning monitor that can detect sub-angstrom level motions in an environment of temperature change. TEL MARK-VZ is a sophisticated photoresist processing tool that provides the perfect solution for semiconductor and electronics manufacturers who need precise and accurate imaging and lithography process. It offers a reliable performance with excellent topography, ensuring that users get the desired results quickly and reliably.
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