Used TEL / TOKYO ELECTRON MARK Vz #9219377 for sale

TEL / TOKYO ELECTRON MARK Vz
ID: 9219377
System.
TEL / TOKYO ELECTRON MARK Vz is a dedicated photoresist equipment, designed to enable precise and efficient processing of photoresist materials. The system is ideally suited for the production of microelectronics, semiconductor, and optoelectronic devices, offering superior uniformity, precision, reproducibility, and reduced exposure energy. TEL MARK-VZ unit boasts a number of features that improve its efficiency and accuracy. The machine features multiple-stage, multi-tan exposure optometry, which allows for the precise alignment of a pattern in preparation for the etching and development process. The high-precision stage optimization techniques used in this tool also help minimize exposure energy, helping to reduce waste and improve efficiency. Additionally, the advanced controlled-depth lens technology ensures uniform exposure on a wide range of substrate materials. TOKYO ELECTRON MARK V-Z is specifically designed to maximize process stability while minimizing particle generation. Its filtration asset is capable of extracting even the smallest particles from the process chamber efficiently, resulting in a process with low particles, even at extremely high throughput. This helps keep important components free of contamination and degradation, further improving yield. The model also features comprehensive programs for process monitoring and quality assurance, helping to ensure the producibility and consistency of components. Visual inspection systems and SEM/EDS analysis technology are built into the equipment to help ensure high quality and reproducibility. MARK V-Z is one of the most advanced photoresist systems on the market. Its superior process control and quality assurance capabilities give users the confidence to produce high-quality components reliably and with confidence. This makes TOKYO ELECTRON MARK-VZ an ideal choice for those looking for a reliable and efficient solution for their photoresist needs.
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