Used TEL / TOKYO ELECTRON MARK Vz #9226209 for sale

TEL / TOKYO ELECTRON MARK Vz
ID: 9226209
Wafer Size: 6"
Vintage: 1995
Developer, 6" 1995 vintage.
TEL / TOKYO ELECTRON MARK Vz is a photoresist equipment, designed for use in semiconductor processing. Photoresist is a light sensitive material used in semiconductor processes such as photolithography, enabling the precise transfer of a pattern from a mask onto the wafer. TEL MARK-VZ is capable of handling semiconductor wafers up to 200mm, and utilizes a state-of-the-art resist coating module, allowing for high precision resist application. Additionally, the system is equipped with a direct contact exposure module and a precision optical caliper for the obtaining of accurate resist pattern results. The unit utilizes a high resolution CCD camera for direct monitoring of the wafer condition prior to the exposure process, along with a low-video noise galvano-mirror that provides precise control of exposure pattern. As the exposure process and coating modules are fully automated, the machine is able to achieve high levels of repeatability for consistently high-quality results. Furthermore, a range of recipes can be easily stored and recalled in the tool's programmable memory asset, allowing for increased efficiency in complex processes involving multiple steps. Additionally, TOKYO ELECTRON MARK V-Z is designed to provide high levels of safety performance, with a low risk of contamination, unintended exposure, and other safety issues. The model utilizes a clean-room compatible gas supply module and is fitted with safety interlocks to prevent unnecessary exposure, as well as gas discharge prevention and cleaning/sterilization after each resist coating process. In addition, the equipment contains an UV safety monochromator which monitors the radiation levels during the exposure process and automatically adjusts the radiation level to the optimal value, ensuring a safe operating environment. Overall, MARK-VZ is a highly advanced photoresist system, offering unmatched levels of precision, safety, and efficiency. By combining state-of-the-art resist coating and exposure modules with advanced CCD monitoring technology, the unit provides users with a reliable and consistent platform for processing high-quality wafer patterns with minimal effort.
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