Used TEL / TOKYO ELECTRON MARK Vz #9250082 for sale

TEL / TOKYO ELECTRON MARK Vz is a photoresist equipment developed to enable advanced UV lithography. The sophisticated lithography capability of the system makes it possible to realize precise patterning of microelectronic circuits, and it is an ideal tool for the production of high performance devices. TEL MARK-VZ uses extreme ultraviolet (EUV) radiation to project a pattern onto a wafer with high transparency, low optical aberration, and low cost. This new technology has been developed to reduce the optical aberration of traditional ALD processes. The main components of TOKYO ELECTRON MARK V-Z include a monochromatic EUV lithography source, a lithography mask, a photomask, and a resist processor. The monochromatic EUV lithography source is an array of plasma sources which emit short wavelength radiation of 13.5nm. The lithography mask is designed to allow the specific optical wavelength of EUV radiation to pass through in order to create patterns on the resist. The mask also acts as a diffraction element. The photomask is an opaque plate with chrome-based designs which are used to create the desired patterns. The resist processor is a unit which can control the exposure time, temperature, and concentration of the resist to enable precise patterning of the substrate. MARK V-Z is also an ideal tool for post-development processes such as de-scumming, sputtering, or oven baking, as well as for internal electrodes and lead frames. Additionally, TEL MARK V-Z is a highly flexible machine, allowing for patterning technologies such as pad oxide etching and shadow mask etching. Overall, TEL/TOKYO TEL / TOKYO ELECTRON MARK V-Z is a reliable and effective photoresist tool with the capability to significantly enhance pixel-level accuracy. It is an ideal tool for modern chip production, and its accuracy, flexibility, and reliability make it an excellent choice for microelectronic device manufacturers.