Used TEL / TOKYO ELECTRON MARK Vz #9399374 for sale

TEL / TOKYO ELECTRON MARK Vz is a new photoresist equipment designed to improve accuracy and speed of photoresist imaging processes. Photoresist is an organic or inorganic material that is used to transfer a pattern onto a substrate. TEL MARK-VZ system consists of a maskless lithography (MLL) unit and a high-resolution projection optics unit. The MLL unit is the key piece of equipment used in the unit and is capable of accurately projecting patterns onto substrates using either optical repeats or single shot projection geometry. The projection optics unit of TOKYO ELECTRON MARK V-Z photoresist machine uses an advanced digital micromirror device (DMD) to manage small beam projection. This DMD utilizes tiny multi-angle mirrors to precisely adjust the exposure level and focal length for each pattern position on the substrate. This adjustment process ensures high resolution imaging and precise exposure control. The projection optics unit's multi-angle mirrors are capable of projecting the entire spectrum of visible light, as well as ultraviolet and infrared radiation. The MLL unit in MARK V-Z photoresist tool also features a field emission display (FED) projection screen. This screen can be used to precisely place and size patterns of various sizes. The FED projection screen is also extremely bright, making it suitable for applications in photolithography. Additionally, this MLL unit can be used with a range of materials for different imaging processes including chemically amplified resists, chemically activated resists, and thermal resists. In addition to the MLL and projection optics equipment, TEL MARK Vz photoresist asset also features a range of features to facilitate imaging processes. For example, this model can store recipes for up to 35 patterns on the pattern database. This ensures that a user can quickly load and begin the imaging process quickly. The equipment also features an automated optical alignment process to help ensure that patterns are accurately projected on the substrate surface. Furthermore, this system can automatically adjust pattern exposure so that users can easily set the exposure time and level they need. Overall, TEL MARK V-Z photoresist unit provides a reliable, accurate, and rapid photoresist imaging machine. Its MLL and projection optics units are capable of accurately projecting patterns onto different substrates, while its automated optical alignment and exposure processes make it easy to set up and run the photoresist process. In addition, users can store up to 35 different patterns for imaging processes, making this tool ideal for both low-and-high-volume projects.