Used TEL / TOKYO ELECTRON Mark #9363451 for sale

TEL Markis a 'photoresist' equipment designed to provide maximum precision lithography performance. It is designed to provide users with the highest accuracy and flexibility possible when processing thin-film materials. This system was developed by TOKYO ELECTRON and is designed specifically for lithography operations related to semiconductor device manufacturing. This photoresist unit utilizes specialized technology which utilizes light to process thin-film materials. Its advanced imaging optics were developed specifically for laser lithography and its submicron imaging performance is one of the finest available today. This helps to ensure that the dimensional accuracy of the process is maintained within the required levels. Besides this, the light source utilized by the machine is of superior quality and the output power of its laser is also highly precise. TEL / TOKYO ELECTRON Markalso features a unique set of functions that enable optimal writing conditions for different thin-film layer materials. It has an advanced auto-focus tool which allows the lithography optics to be perfectly aligned, ensuring that even complex patterns are reproduced with pristine clarity. Its versatile stage asset also makes it easier to align the substrate and tool, while its Stage Pinpointing Module ensures outstanding performance when aligning small portions of the thin-film. TEL Markalso has a JobControl Module enabling users to easily set the operations, select the desired parameters, and perform a range of lithography related tasks. It provides increased productivity, higher throughput, and a reliable process. Along with this, it has powerful software tools, like the job editor and pattern search, that aid users in seamlessly creating and controlling lithography projects. Overall, TOKYO ELECTRON Markis a highly advanced photoresist model that enables superior fidelity lithography of thin-film materials with superior accuracy and flexibility. With its advanced optics and stable laser light source, excellent auto-focus equipment, and straightforward software tools, it provides users with the performance and ease of use needed to quickly produce high-quality and accurate photoresist layers.