Used TEL / TOKYO ELECTRON / NEXX Stratus 200 #9187451 for sale

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ID: 9187451
Wafer Size: 6"-8”
Vintage: 2009
Electroplating system, 6"-8” Cassette to cassette: Yes Process: CU and AU Tanks: No Power Requirements: 120/208 V, 150.0 A, 50/60 Hz, 3 Phase CE Marked 2009 vintage.
TEL / TOKYO ELECTRON / NEXX Stratus 200 Equipment is a high-performance photoresist system currently used in a variety of industrial applications, such as semiconductor and flat panel display manufacturing. TEL Stratus 200 Unit is comprised of a vacuum wafer loader, substrate transfer robot, vacuum wafer handler, and lithography tool, as well as various peripheral components. The vacuum wafer loader is used to transport substrates and maintain them in a uniform pressure environment, ensuring that exacting specifications are met. This device runs on a stepper motor and can be programmed through to hold up to 50 8-inch wafers. The substrate transfer robot is used to pick up the substrate from the loader and transport it to the lithography tool. This robot has six degrees of freedom and is highly precise and reliable due to its brushless-DC motor machine. It is constructed of stainless steel and has a lightweight yet rugged design. The vacuum wafer handler is a vacuum device used to hold up to 300 8-inch wafers in a uniform pressure environment. This device is constructed of aluminum and uses a proprietary measurement tool to accurately and consistently measure the substrates. The lithography tool is the primary component of NEXX Stratus 200 Asset. This tool is designed for nano-precision and features a very precise and stable optical model. It uses advanced imaging systems and sophisticated software to provide maximum performance for a variety of applications. Additionally, it features advanced mask alignment and controllable and automated exposure techniques. Stratus 200 Equipment is a highly reliable system that is capable of meeting the precision demands of a variety of industries. Its sophisticated components, superior construction, and its combination of advanced imaging and software, make it one of the top solutions for photoresist processing.
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