Used TEL / TOKYO ELECTRON NS 300 #9245729 for sale
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TEL / TOKYO ELECTRON NS 300 is a photoresist equipment ideal for photolithography and thin film deposition processes. It is manufactured and supplied by TEL (TOKYO ELECTRON), the world's largest semiconductor production equipment supplier. The system has several features which optimize photolithography processes among other film deposition processes. TEL NS 300 can process 75 mm and 150 mm substrates with a feature control of 2 micron. It has advanced capabilities for wafer flatness, profile modification, and edge rounding. The unit also allows for tight overlay control with an accuracy of 0.5um. The machine uses a gas reflow technique to reduce complex air-bearing tool problems, ensuring smooth and consistent mechanical movement. The asset is PC controlled and a graphic user interface model makes it easy to operate. The PSM driving unit offers excellent and quick mobility. With an area scan speed of up to 70 mm/s, the equipment ensures a photolithography process that is faster than traditional methods. A programmable job control system allows for great customization of features and free-form movements. It also allows the user to explore programmable parameters to ensure optimization of process conditions. The unit also has an automatic endpoint detection machine with an accuracy of 0.2 um and the endpoint is based on the optical signal of the substrate. TOKYO ELECTRON NS300 is equipped with a stable ion beam source to reduce tool drift and ensure good consistency in performance. Both the wafer holder and the sample positioning stage are separately heated and cooled and can reach temperatures up to 200 degrees Celsius. This temperature range is optimal for photolithography processes. The asset also has a unique feature of providing in-situ real time simulation/demonstrations to help in equipment selection and commissioning. It is also equipped with a preconfigured shielded laser interface for further process optimization of beam exposure. This model is a one-stop solution for all advanced photolithography processes. It is an easy to use equipment with great features to ensure great performance and reliability. The system is suitable for wafer processing at high speeds and can be used to create applications in semiconductor, printed circuit board, integrated circuit, and micro-electromechanical systems (MEMS) products.
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