Used TEL / TOKYO ELECTRON NS 300 #9251833 for sale

TEL / TOKYO ELECTRON NS 300
ID: 9251833
Wafer Size: 12"
Vintage: 2005
System, 12" 2005 vintage.
TEL / TOKYO ELECTRON NS 300 is a highly advanced and specialized photoresist equipment for the deposition of micro-scale and nanoscale patterns on substrate surfaces. It is specifically designed for use in the fabrication of devices such as integrated circuits, which require a high degree of precision for depositing patterns. TEL NS 300 is composed of three major components: a computer control system, a beam scanner, and an electron beam gun. The computer control unit is responsible for controlling the beam scanner, which orients and scans the electron beam in a continuous or stepped motion, allowing control of the photoresist deposition pattern. The electron beam gun is a high-intensity device that generates a beam of electrons with a high degree of precision. This beam of electrons is then directed onto the substrate surface, where the photoresist is deposited. TOKYO ELECTRON NS300 Photoresist Machine offers versatile, high-precision functionalization capabilities. It is equipped with intelligent feedback mechanisms that can detect any defects in the beam or surface pattern characteristics. This allows the user to adjust the beam direction and energy to ensure that the desired pattern is produced. The tool is also equipped with a variety of pattern encoding schemes, including both one and two-dimensional layouts, to provide a more versatile deposition capability. In addition to its advanced functionalization capabilities, TEL / TOKYO ELECTRON NS300 Photoresist Asset also provides an economical, high-resolution coating process. This is due to its ability to deposit a thin layer of material on the substrate surface that exhibits excellent adhesion to the substrate surface. The cost of the process is minimized due to the high efficiency of the model. TEL NS300 Photoresist Equipment is an advanced platform that provides essential components for the fabrication of devices using photolithographic techniques. It is highly reliable and efficient, with versatile functionalization capabilities and a cost-effective, high-resolution coating process.
There are no reviews yet