Used TEL / TOKYO ELECTRON PHP Oven for ACT 8 #9273728 for sale
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ID: 9273728
TEL / TOKYO ELECTRON PHP Oven for ACT 8 is a photoresist equipment used in the photolithography process of semiconductor device fabrication. This versatile tool is designed to provide a secure environment for the development of both positive and negative photoresists. The system is composed of a chamber equipped with a dual transport mechanism, advanced heating and cooling systems, as well as an integrated robotic arm. The chamber is also designed to enable the repair of masks and object surfaces if necessary. The dual transport mechanism of the oven allows for the loading and unloading of both wafers and other objects on the same substrate. This allows for quicker and more efficient processing from switching between different photoresists and substrates. It is also equipped with adjustable mechanical parameters to further streamline the process. The temperature control of the unit is done using an advanced PID-based temperature controller that is capable of maintaining both high and low temperatures. This ensures that photoresist layers are properly cured and developed. Additionally, the oven features an advanced cooling machine which safely removes excess heat and quickly brings back the temperatures to the desired levels. The robotic arm is designed to ensure accurate and secure positioning of objects when being transferred to and from the chamber. This provides great levels of precision and ensures that the processing of object is done in the most optimal way with minimal damage. The long-term stability and safety of the machine is reinforced by the use of proprietary processing programs, built-in diagnosis functions, maintenance data logging, and an integrated safety monitoring tool. All of these ensure that the asset runs smoothly and that any problems can be quickly identified and addressed before it affects the production. All in all, TEL PHP Oven for ACT 8 is an invaluable tool in semiconductor device fabrication. Its advanced features, robust design, and precision capabilities ensure reliable and efficient processing of photoresist layers.
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