Used TEMG TAI CT-1932 #9356045 for sale

Manufacturer
TEMG TAI
Model
CT-1932
ID: 9356045
Wafer Size: 6"
Vintage: 2002
Developer system, 6" (2) Pressure tanks 2002 vintage.
TEMG TAI CT-1932 is a high-performance, multi-mode photoresist coating equipment featuring a high-precision stepper/scanner and innovative imaging technology for the most demanding customers. The system is based on FTF (Focused Thermal Freeze) technology, and offers excellent resolution, tight registration, and excellent machinability. The unit is perfect for coating wafers, substrates, tapes, and other materials with photoresist. CT-1932 employs a high-resolution stepper/scanner to precisely position the array of resistive nozzles onto the substrate. With adjustable nozzle pattern, the user can readily configure the machine to match their specific requirements. The stepper/scanner also permits precise center-to-edge registration, allowing for a much tighter coating tolerances. The tool's 9-axis robot arm houses a powerful thermal imaging asset to ensure optimal coverage. The model also offers a smart material flow and viscosity control equipment for different photoresists, helping to create optimal coating uniformity. Additionally, built-in at-line inspection tools and an auto-control system help optimize the deposition process for maximum reliability and efficiency. TEMG TAI CT-1932 also includes advanced monitoring and control systems for recipes, temperature, pressure, and humidity, offering a complete package for photoresist deposition. In general, CT-1932 offers high-precision and efficiency in photoresist coating at the highest standards. The unit offers excellent resolution, tight registration, smart material flow control, and at-line inspection tools for optimal deposition of photoresists. The advanced monitoring and control systems also ensure maximum reliability and efficiency. The built-in features and sophisticated technology make TEMG TAI CT-1932 a leading photoresist machine for the advanced photoresist market.
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