Used TEMPRESS 420 #104136 for sale

TEMPRESS 420 is a type of photoresist system. It is a photolithographic material used in etching and engraving processes, mainly in semiconductor device fabrication. 420 is a positive working and chemically-amplified positive photoresist. It resists radiation exposures in the ultraviolet and deep ultraviolet regions of the electromagnetic spectrum, as well as electron beams and X-rays. TEMPRESS 420 is highly photosensitive, has excellent photospeed, and can be used to produce excellent line resolution. The resist forms easily removable resist structures, owing to its high resist dissolution rate, which allows for easier and less costly etch processes. The resist provides improved overall performance compared to conventional photoresist systems. 420 contains two components. The first is a polyphenolics resin, which acts as a stabilizer and provides an improved optical reflection of the photoresist, allowing for a better depth of focus. The other part of the photoresist is an acrylate monomer, which is polymerized during the exposure process. The monomer molecules swell and convert to a solid when exposed to radiation, shielding the underlying microelectronic substrate from attack by the etch or engraving process. When exposed to radiation, the polyphenolics resin and acrylate monomer polymerize, forming a positive image in the resist. Additionally, the acrylate monomer provides very good adhesion of the photoresist to the underlying wafer, allowing for improved etch profiles and larger line width. Another advantage of TEMPRESS 420 is its compatibility with photolithographic processes, allowing for precise positioning of the photoresist. Photolithography is a process that uses high energy radiation to produce patterns of microelectronic elements on a wafer. The radiation is typically narrow in frequency, allowing high precision in patterning very small elements on the substrates. This allows for the use of very precise masks with precise patterns, which are essential for making complex microelectronic devices. Finally, 420 is a very eco-friendly photoresist system, as it contains no VOCs (volatile organic compounds) and the active components have low toxicity. As such, it can be a preferred choice for environmentally conscious production facilities. In conclusion, TEMPRESS 420 is a positive working and chemically-amplified positive photoresist system which provides excellent performance when used to etch and engrave microelectronic substrates. It provides improved photospeed, excellent line resolution, and better adhesion of the photoresist to the underlying wafer. Additionally, it is compatible with photolithographic processes, making it ideal for complex patterns, and is eco-friendly and low-toxicity.