Used TOHO KASEI SD-08 #9280582 for sale

TOHO KASEI SD-08 photoresist system is a high-performance, precision lithography system used in the manufacturing of semiconductor devices. It is ideal for advanced device fabrication, providing a high degree of accuracy and repeatability while enabling the highest yields in advanced semiconductor device production. SD-08 uses the latest photolithography technologies, including sub-half-micron resist resolution, uniformity control, and high-purity, maskless lithography. It also incorporates several materials coating processes including spin coating, airbrush application, and static spray coating. TOHO KASEI SD-08 is a three-in-one maskless lithography machine comprised of an object hold stage, a wafer exposure stage, and a resist removal stage. The object stage is responsible for the accurate registration of the object for alignment and exposure. The exposure stage, which is made up of two laser sources, emits the laser beam at a wavelength of 193 nanometers to effect a microscopic chemical exposure on the object. The resist removal stage then uses the thiol-based stripping agent to remove the exposed resist, leaving only the patternedresist remaining intact. SD-08 offers a high degree of resolution and accuracy for advanced device production. The 193 nanometer laser wavelength provides a high level of resolution by enabling sub-half-micron resist resolution. Additionally, the laser's uniformity control ensures that the same amount of laser energy is directed towards every spot on the object, resulting in precise exposure. Finally, maskless lithography ensures that the photolithography process is free from errors due to misalignment or inaccurate registration of the masks. TOHO KASEI SD-08 is ideal for advanced semiconductor device production, offering a high degree of accuracy, precision, and resolution. With its laser source and uniformity control, SD-08 ensures that the highest yields are achieved through precise alignment and exposure. Its thiol-based stripping agent also ensures quick and easy removal of exposed resist, leaving only the desired patterned resist intact.