Used TOHO KASEI SD-08 #9280838 for sale

TOHO KASEI SD-08
Manufacturer
TOHO KASEI
Model
SD-08
ID: 9280838
Wafer Size: 8"
Vintage: 1994
Spin dryer, 8" 1994 vintage.
TOHO KASEI SD-08 is a photoresist equipment developed by TOHO KASEI Co., Ltd. for coating and patterning of substrates for electronics, optoelectronics and MEMS applications. The system comes with two innovative technologies that are not found in other photoresist systems. The first technology is the novel Substrate Dirigent Dispensing Method (SDD). This method uses a proprietary precision dispensing mechanism that is capable of providing a uniform coating of photoresist to substrates that may have different features such as different thicknesses, curvatures and substrate orientations. This precise application of the photoresist ensures uniform coverage and more accurate patterning without the need for additional post-processing. The second technology featured in SD-08 is its advanced Photon Emission Hotspot Detection Method (PEHD). This method enables TOHO KASEI SD-08 to detect the alteration of the energy distribution pattern of the photoresist and the substrate caused by the heating of the substrate when exposed to a laser beam. This allows the unit to automatically adjust the laser power and other parameters to ensure optimal exposure, resulting in improved pattern transfer and high-precision imaging. SD-08 also comes with other helpful features such as the high-sensitivity image-enhanced photography module, which helps obtain higher resolution images, and a layer thickness control machine, which allows the user to set the photoresist layer thickness for a more accurate patterning process. In summary, TOHO KASEI SD-08 is an advanced photoresist tool that features two technologies - the Substrate Dirigent Dispensing Method and the Photon Emission Hotspot Detection Method - to provide a more even and accurate application of the photoresist and to ensure optimal laser exposure for improved pattern transfer and high-precision imaging. Its other helpful features round out this asset as a versatile and advanced photoresist solution for electronics, optoelectronics and MEMS applications.
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