Used TOHO KASEI SD-08 #9280840 for sale

TOHO KASEI SD-08 is a photoresist equipment designed to be used for lithographic processes on semiconductor plates. It is a highly sensitive and reliable photomasking technique which can expose patterns on a wafer with imaging accuracy. The system is an integrated tool for developing and altering photoresist layers in the fabrication of electronic components. The basic structure of SD-08 comprises a light source and a reticle with photomask patterns. The reticle is mounted in a position that is ready to accept the exposure light from the light source. The photoresist layer of a wafer is first polished with a polishing solution. Afterward, the substrate is affixed to a spin chuck. The spin chuck is fixed in a position and aligned to the reticle. A precise rotation speed is set to allow for a uniform exposure of the substrate to the light. After the exposure to the light, the wafer is transferred to a developer unit. The developer unit uses a chemical solution to dissolve the exposed parts of the photoresist. This creates the desired patterns on the wafer. TOHO KASEI SD-08 is an efficient and precise photoresist unit that uses an advanced optical machine to deliver accurate images. It offers users the convenience of quickly making changes to the order of the photomask patterns. It is also capable of producing high quality images with small feature sizes. SD-08 is a reliable tool that can provide accurate results. It helps users make precise semiconductor devices with exact specifications. This photoresist tool can be used to create a wide range of products.