Used TRYMAX NEO 2000 #9238169 for sale

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Manufacturer
TRYMAX
Model
NEO 2000
ID: 9238169
Wafer Size: 5"-8"
System, 5"-8" Dual chamber ashing platform (3) Cassette stations (2) BROOKS Versaport 2200 Integrated SMIFs (5) Axis dual arm robots with specific wafer grippers (4) Process modules: Microwave downstream (2.45 GHz) RF Bias (13.56 MHz) DCP (RF Bias, direct coupling plasma) Mechanical throughput: > 100 wph Applications: Bulk resist strip Descum processing Polymer removal Post high dose implant strip Silicon nitride etch application MEMS Application Compliance: SEMI S2-01 SEMI S8-01 CE EU-RoHs.
TRYMAX NEO 2000 is a leading photoresist equipment developed for precision photomask leadframe processing. The photoresist coating is a joint development between TRYMAX and the Hitachi Chemical Company, which offers a number of advantages to its users. The photoresist helps to prevent diffusion, bridging, edge bead and other common defects in leadframe processing. This provides users with superior throughput and superior results in leadframe processing. The photoresist system is easy to use and allows the user to quickly establish pre-calibration, fine tune parameters, and adjust as needed for variations in product design. This ensures that leadframe processes are optimized to the highest level for every production lot. NEO 2000 is also designed to maintain a high level of accuracy. This is achieved through accurate inspection of the leadframe layer and through dense head compression. This helps to ensure uniform layer coverage and helps reduce leadframe defects. The photoresist unit also offers increased photomask protection against light and other forms of contamination. This helps to extend the life of the photomask and reduces the costs associated with production repairs. In addition, the photoresist machine is compatible with most industry standard photomasks. This eliminates the need for the user to invest in a separate photomask for each job and helps to keep the cost of production down. TRYMAX NEO 2000 is a reliable photoresist tool that offers users superior processing accuracy and improved product quality. With its ease of use and its cost-efficient production capabilities, it is an excellent choice for leadframe processing.
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