Used TRYMAX NEO-3000 #9269770 for sale

TRYMAX NEO-3000 is a state-of-the-art photoresist equipment designed for advanced lithography applications. It utilizes a combination of innovative technologies, designed to enable superior matching of the related exposures. These include Grayscale Positive Intensity Modulation (G-PIM), Vertical Alignment (VA2) and Selective Pattern Placement (SPP), which together allow for advanced pattern matching between photo resist layers. The result is that fine feature sizes and good CD uniformity can be achieved with minimal adjustment of exposure parameters. NEO-3000 features a high-precision, high-speed multiphase vector scanner with variable scan widths. This is an extremely accurate device, capable of reaching +/-0.2um accuracy for feature size control. This accuracy enables excellent pattern matching between different photo resist layers with much lower levels of adjustment needed. The system also includes a high-frequency light source, coupled with a wide range of customizable exposure control parameters. This enables users to achieve the exact cutting accuracy and depth that they require. Furthermore, TRYMAX NEO-3000 has a dosing tool that can accurately control the exposure time and dose precisely according to user-defined parameters. NEO-3000 also includes a suite of monitoring systems, that allow users to monitor the performance of the unit in real time, helping minimize any error-prone practices. Overall, TRYMAX NEO-3000 is an advanced photoresist machine, designed to deliver superior pattern matching between photo resist layers, with very low levels of adjustment needed, as well as a high level of accuracy and repeatability. It is the perfect solution for any lithography application that requires precise pattern placement, complex pattern matching or feature size control.