Used ULTRA OPTICS Mini II #293597469 for sale

ULTRA OPTICS Mini II is a photoresist equipment developed by ULTRA OPTICS and used for precision micro-patterning. Photoresists are materials that undergo changes in solubility upon exposure to specific electromagnetic radiation, such as ultraviolet light. Mini II offers wavelength-selective exposure and photo-chemistry that can create intricate and complex patterns on photoresist surfaces. This system uses a light source whose spectrum can be adjusted to match the desired pattern. It allows precision and flexibility in exposure range, making it ideal for creating intricate, detail-oriented patterns. It also comes with a vacuum table to create high-resolution patterns with minimal distortion. The unit's user-friendly design makes it suitable for use in laboratories, universities, and other similar facilities. The machine can easily be tailored to specific applications. With the angle adjustment feature, different angles of exposure can be provided. The tool also allows time control to ensure the accuracy of the exposure. For additional convenience, ULTRA OPTICS Mini II includes an optional automatic calibration asset. This allows the user to quickly and accurately adjust the exposure for various resist materials, substrates, and process conditions. The model is also able to provide support for various photoresists. With proper pre-treatment of the substrate, even low-contrast or highly absorbing materials can be handled with the equipment. The system is also capable of producing high-resolution patterns using advanced exposure techniques, such as cold and deep exposure. Mini II offers reliable performance and durability. This is due to its robust and durable design, as well as its superior light unit. The unit's stability also ensures that its performance remains consistent during extended usage. Overall, ULTRA OPTICS Mini II is an ideal choice for creating intricate, detailed micro-patterns on photoresist surfaces. This machine offers precision and flexibility in exposure range, as well as support for various photoresists. Its user-friendly design and robust performance make it suitable for use in laboratories, universities, and other similar facilities.