Used ULTRA OPTICS Mini II #9316393 for sale

ULTRA OPTICS Mini II is a photoresist equipment designed for advanced electron beam lithography applications. It is a high performance system that is capable of producing high resolution images with very precision and accuracy. Mini II features a single-stage electron beam column with a lightfield display, which allows for dynamic resolution adjustment. It offers a variety of imaging techniques electronically as well as a precision manual movement of the beam and optics. This unit is also equipped with an automatic alignment machine which precisely aligns each of the beams and objects that need imaging. ULTRA OPTICS Mini II utilizes photoresists to create high resolution features. Photoresists are materials that are sensitive to light, ultra-violet (UV) light in particular, and when exposed to UV light are chemically altered with light intensity playing a role in their reactivity. Mini II tool features a variety of photoresist types, both negative and positive, for a wide range of applications. All the available photoresist types are designed to work with the single-stage electron beam column on ULTRA OPTICS Mini II. When using Mini II, the user can adjust the beam current and speed, as well as the focus, to achieve the best exposure results for different photoresist types. Additionally, different scan patterns, such as raster, rectilinear, spiral, and hessel patterns, can be pre-programmed prior to exposure to achieve the best resolution possible. ULTRA OPTICS Mini II is designed for precise imaging of various features and patterns, making it well-suited for manufacturing processes such as semiconductor fabrication. It is capable of producing feature sizes ranging from 0.2 nanometers to several microns. Additionally, this asset is designed for ease of use and offers a comprehensive suite of software accessories, further extending its capability. In summary, Mini II is an advanced electron beam lithography model designed for fabrication needs. It is equipped with an advanced, single-stage electron beam column which allows for dynamic resolution adjustment, as well as a variety of available photoresist materials for many different applications. With its precision imaging and a comprehensive set of software accessories, ULTRA OPTICS Mini II is an ideal equipment for advanced microfabrication.