Used ULTRATECH 504 #9280245 for sale

ULTRATECH 504
Manufacturer
ULTRATECH
Model
504
ID: 9280245
Developer system.
ULTRATECH 504 is a photoresist equipment designed for use in the production of circuit boards and other electronic components. The system uses a combination of ultraviolet (UV) light and high-quality radiation-sensitive photoresist materials to create permanent circuit patterns on printed circuit boards (PCBs). 504 provides patterning and plating solutions for a range of board types and geometries, including single & double-sided, multi-layer, through-hole, and surface mount. The unit consists of a light source, a processor, and a resist management machine which manage and control the entire process. The light source used in the tool is a mercury arc lamp with a 400-500W power rating. This produces a high-intensity, UV light with a wide range of wavelengths. In order to produce a well-defined and accurate circuit pattern, the light source is precisely moved between the axial and radial directions to provide a higher resolution. The processor and resist management asset of ULTRATECH 504 aids in the production of consistent and reliable circuit patterns. The processor is a control model responsible for initiating the exposure process. Once the pattern to be printed is selected, the processor determines the exposure time and light levels required for that pattern. The UV light and photoresist properties are then adjusted accordingly to ensure a successful outcome. The resist management equipment activates the resist components to be used. Depending on the type of project, different types of photoresists may be employed. This system monitors the flow of resist through the unit ensuring a seamless and efficient resist deposition. One of the major benefits of 504 machine is the high-quality circuit outputs it provides. The highly advanced light source and processor allows for a high-resolution finish that provides greater accuracy in the circuit patterns. This tool is also engineered to create an efficient workflow, providing a safer and faster photoresist production.
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