Used ULTRON SYSTEMS INC UH 114 #9139674 for sale

ULTRON SYSTEMS INC UH 114 is a sophisticated photoresist equipment which provides optimal exposure for photoresist applications. It uses advanced optics and proprietary software to ensure accurate and consistent results. The system consists of a high-powered strobe light source, two laptops, and a variety of optical components. The light source provides a beam of highly coherent light at a specified frequency and pulse rate, while the optical components modulate the light beam as needed. The two laptops provide the user interface for the unit, including calibration and image acquisition. UH 114 is capable of delivering precise, uniform exposure over large areas, enabling superior resolution and minimized distortion compared to other photoresist systems. The high power strobe source enables high exposure resolution, and the reliable reproducibility allows for reliable, repeatable results. To ensure accuracy and repeatability, ULTRON SYSTEMS INC UH 114 performs a variety of calibration and calibration pre-screening routines prior to each exposure. The calibration pre-screening process serves to reduce exposed area distortions while checking sensor responses and process margins. Additionally, it constantly monitors and preserves optical consistency between exposures. During an actual exposure, the photoresist is applied over the substrate, and then UH 114 generates the light source and precisely modulates its exposure according to the desired pattern. Finally, ULTRON SYSTEMS INC UH 114 includes an automatic optimization feature which monitors the exposure over time and adjusts the power level and exposure settings as needed. This ensures that the optimal exposure parameters are maintained, and minimizes exposure variability and warpage. Overall, UH 114 is an advanced photoresist machine that provides precise, uniform, and repeatable exposures over large areas. Its powerful optical source, calibration pre-screening tools, and optimization feature ensure reliable results. Its features make it an excellent choice for photoresist applications.