Used ULTRON SYSTEMS INC / USI Prism 350 #9092430 for sale
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ID: 9092430
Selective coating system
PMP (Precision metering pump) liquid delivery system
Custom spray head
Custom liquid storage
Pumping and mixing.
ULTRON SYSTEMS INC / USI Prism 350 is an advanced, modular, and cost-effective photoresist developing equipment designed for all lithography applications. This system is used to apply resist to a wafer and then expose it to UV or visible light. This enables the user to pattern the resist and then etch away the portions of the wafer exposed to the light. The unit offers superior performance in accurate resist coating and delicate resists patterning, due to its precise dosing accuracy and advanced automation. It features a wafer robot for positioning a cassette of wafers onto the wafer pod, and a precision pumping machine that provides accurate dispense and rinse times. The wafer can be exposed to light through either a contact or a proximity tool, and then the integrated substrate heating ensures a consistent resist development process. The tool also offers enhanced environmental protection by containing a precision distilled and filtered water source for cleaning processes, as well as an integrated film edger for precise resist coating. The automated waste disposal asset is designed to reduce particle generation while rinsing. Functionality is further enhanced with the user-friendly graphical user interface, which provides an intuitive workflow and predictive diagnostics. The Hybrid systems - featuring both contact and proximity - incorporate touchscreen technologies, enhanced alignment accuracy, extended dose range and additional resolve capability. USI Prism 350 photoresist developing model offers flexibility, performance and ease-of-use in a cost-effective package. It provides reliable and efficient production with a high throughput and consistent production yields. With its wide range of features and advanced automation, this equipment is ideal for high-volume production processes and for the development of sophisticated, advanced, and delicate resists in a variety of processes and applications.
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