Used ULTRON SYSTEMS INC / USI UH 102-8 #9113171 for sale

ULTRON SYSTEMS INC / USI UH 102-8 is a high-performance, fully-integrated photoresist processing equipment specifically designed to improve semiconductor manufacturability and yield. It is configured with two powerful processing sources and a 16-bit MicroH processor. The system is built with leading-edge technology that integrates laser scanning and cleaning to minimize particle contamination and ensure superior results. The unit permits integration of multiple workflows and application of numerous etch technologies. Its main features are the active substrate image stabilization (ASIS) and a core registration machine that provide the highest level of accuracy and repeatability for the pattern transfer. The tool also offers excellent field uniformity, improved pattern fidelity, reduced flat top height, and a reduced depth. The whole package includes an integrated source, optical filter, laser shutter, beam blanking, a film motion mechanism, slit mechanism, and gas delivery subsystems. The asset also provides a wide range of exposure sources ranging from broad spectrum resist to advanced light sources (AL) sources. Additionally, USI UH 102-8 provides a large selection of options such as interior view port, integrated clean room walls/facility, ultraviolet and laser sources, manual/ Auto Adjustment Stations, laser scanning model, and microspot mask. The automatic film and slit measurement capability, along with the automatic beam alignment equipment, also ensures that error-free exposure can be achieved in a variety of applications. The ASIS mechanism automatically corrects for small substrate errors (even in the sub-micron regime) to ensure accurate image placement. Moreover, the high-performance optics and the laser scanning technology ensure fast and efficient images for all exposures. Overall, ULTRON SYSTEMS INC UH 102-8 is an outstanding photoresist processing system specifically designed to meet the requirements of advanced semiconductor manufacturability and yield objectives. Its sophisticated systems and technologies ensure superior performance and reliability of patterns transfer. The unit's high-end features also guarantee highly accurate, repeatable, and low-spread results.