Used ULTRON SYSTEMS INC / USI UH 102 #9124003 for sale
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ID: 9124003
Wafer Size: 6"
Vintage: 2000
UV curing oven, 6"
UV lamp lamp intensity 25 mW/cm2
Wavelength: 254.7 nm
Exposure time 35 sec
2000 vintage.
ULTRON SYSTEMS INC / USI UH 102 is a photoresist equipment designed for the development of direct writing lithography processes and is commonly used in precision lithography applications. The unit is a complete, integrated photoresist system designed to produce reproducible, high-resolution microstructures on substrates or wafers. It is capable of producing precise, strong structural features and sharply defined patterns in the range of 1 μm to 5 μm in size. The unit is designed to optimize exposure accuracy, stability, and linearity, enabling the production of assertive features with minimal process steps. USI UH 102 utilizes a two-stage resist process; the first stage is the thermal deposition and patterning of a resist material, while the second stage is where the resist is post-processed with a series of developer steps. The unit has a precise heating machine, which allows for uniform deposition of the film and features a digital controller with a display that provides an intuitive interface for temperature selection. Additionally, the unit has an exposure range of up to 50mW/cm2 and up to a 0.1μm resolution feature size. The tool also has a built-in spatial resolution testing asset, as well as a post-exposure monitoring model for consistent process output. This equipment is capable of detecting any changes in the film thickness during the resist development process by evaluating the film surface contrast. ULTRON SYSTEMS INC UH 102 is also equipped with a precision metrology system, allowing for the measurement of small features in the range of 1 μm to 5 μm, while also providing an understanding of the substrate's micro-geometry. UH 102 has an automated resist coating unit designed to provide uniform resist film thickness and features an automated post-exposure developer machine that can be programmed to consistently provide a consistent, precise post-exposure pattern. Additionally, the unit has a high-precision photoresist dispensing tool, which is easily adjustable and capable of providing a uniform dispense rate. Overall, ULTRON SYSTEMS INC / USI UH 102 is an efficient and reliable photoresist asset, offering a high-precision lithography process that can produce repeatable, high-resolution patterns with the minimum number of process steps. The model's numerous features, such as the digital controller, automated resist coatings, post-exposure developer, and metrology equipment, make it highly applicable to precision lithography applications. USI UH 102 is a reliable, precise, and cost-effective lithography tool.
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