Used ULTRON SYSTEMS INC / USI UH 108 #9394207 for sale

ULTRON SYSTEMS INC / USI UH 108 is a photoresist equipment, designed to produce photomasks and lithographic plates for use in microelectronic device fabrication. It consists of a 875 nm laser diode with a 40 watt source or a 633 nm laser with a 35 watt source. The system is capable of achieving dimensional accuracies of up to one micron, making it suitable for applications requiring high resolution imaging and device feature sizes. The photoresist unit has several features to enhance its usability. It has an automated wafer handling machine which allows for rapid loading and unloading of wafers up to 200mm in size. The tool also includes a diode laser cooling subsystem to maintain proper temperature ranges for the laser diode, and a solid-state DC power supply for reliable and stable operation. The photoresist asset includes a wide variety of features to ensure quality imaging. These include a Pulsed Width Modulation (PWM), which allows for the adjustment of the pulse widths in increments of 1.0 milliseconds. This allows for precise control of the laser pulse which results in improved imaging accuracy and repeatability. The model is also capable of handling a variety of film thicknesses up to 1 mm with no splice effects, ensuring a continuous pattern. In addition to these features, the photoresist equipment has a number of software packages available to help in the setup and operation. These software packages allow users to store custom patterns in memory, edit them on the system, and transfer them to the image file for use. This makes it easy to create complex photomasks and lithography plates. Finally, the photoresist unit includes additional safety features including the use of ESD grounding busses, isolation of all sensitive circuitry, and filter systems to detect and control ambient light. All of these features ensure users that they are using a safe and reliable machine that produces high quality images while protecting their equipment from airborne particulate and static electricity damage. In conclusion, USI UH 108 is an ideal photoresist tool for applications requiring high resolution imaging and device feature sizes. Its automated wafer handling asset and laser cooling subsystem allow for rapid loading and unloading while its advanced image manipulation capabilities provide excellent imaging accuracy and repeatability. Additionally, its high level of feature safety make it an ideal choice for any microelectronic device fabrication application.