Used ULTRON SYSTEMS INC / USI UH 108 #9395569 for sale
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ID: 9395569
Wafer Size: 6"-8"
Tabletop laminator, 6"-8"
Power supply: 120 VAC, 1 A, 50/60 Hz, Single Phase.
ULTRON SYSTEMS INC / USI UH 108 is a state-of-the-art photoresist equipment designed for precision imaging. The system features a high power UV light source, which ensures that imaging results are accurate and consistent. The UV light source is coupled with a powerful imaging unit that converts the light into digital signals, allowing for precise control over the image resolution. USI UH 108 features an enlarged imaging stage and is capable of magnifying images up to 1000x, depending on the aperture size. This feature allows for a greater amount of detail to be captured in a single image. The machine also features a user-friendly interface that allows for easy adjustment of the parameters, making imaging highly precise and convenient. The photoresist tool utilizes highly advanced technology to provide a low-dose, low-power imaging. This helps to minimize the risk of damage to sensitive components during the imaging process. The low-power imaging also results in reduced production costs. ULTRON SYSTEMS INC UH 108 also offers an advanced Vacuum Chamber, which helps with the production cycle and ensures that the photoresist solution applied is uniform and of a consistent thickness. This helps to ensure that the required accuracy is achieved while optimizing the process time and producing high-quality results. The asset also includes a built-in imaging software that enables the user to make adjustments to the image from any remote location. This makes UH 108 highly versatile and allows for quick and easy imaging process. It is suitable for use in a range of applications, including robotic lithography and volume production environments. ULTRON SYSTEMS INC / USI UH 108 has been designed to meet the most stringent of demands with regards to advanced imaging technology. It provides highly accurate results, is user-friendly and is suitable for use in multiple production environments. This makes it an ideal choice for those looking for a precise photoresist model that is both reliable and cost-effective.
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