Used ULTRON SYSTEMS INC / USI UH 108B #9121202 for sale

ULTRON SYSTEMS INC / USI UH 108B is a photoresist equipment that has been designed to provide extremely accurate and precise image resolution for photolithography applications. The unit offers several benefits including fast development time, excellent processing requirements, and advanced processing features. The system consists of a pre-cleaning station, photoresist processor and hotplate. The pre-cleaning station is designed to prepare substrates prior to imaging. It utilizes a special chamber that removes micro-contaminants from the surface of the substrate and properly prepares it for imaging. The photoresist processor is the heart of the unit and is capable of processing both positive and negative images with high accuracy. It uses a combination of light and chemical action to develop the exposed image on the substrate. The unit utilizes an advanced computer-controlled photoresist application machine to ensure accurate and precise images. It also includes a hotplate, which is used to aid in the development of the images. The Ultron photoresist tool has been designed to meet the precise demands of advanced scientists and engineers. It is able to produce sub-micron images with high resolution and excellent contrast. This makes it ideal for applications such as creating integrated circuits and flat panel monitors. The asset also has the capability of producing high-quality, multiple-exposure images for advanced lithographic applications. The unit is designed to be reliable and efficient and offers an impressive amount of output in a relatively short space of time. It also has a large processing capacity and can support a wide array of photoresist materials. The model is also highly customizable and allows for specific recipe settings to be created and stored. Overall, USI UH 108B is an effective and reliable photoresist equipment. It provides high accuracy, precise images and is able to meet the demands of advanced imaging projects quickly and effectively. Its versatility and customizable features make this photoresist system suitable for a variety of applications.