Used ULTRON SYSTEMS INC / USI UH 110 #9099954 for sale

ULTRON SYSTEMS INC / USI UH 110 is a photoresist equipment that has been developed for precision processing of various substrates. It uses an advanced application method of pulsed UV radiation for production of large area microstructures. This system is widely used in industries related to photonics, optoelectronics, medical technology, and semiconductor processing. The photolithography unit comprises of a substrate handling machine, a mask, a Lamp Source, a wavelength monitor and a control unit. The substrate handling tool includes a fixed table for holding the substrate, and several stages for transport, transport control and positioning. The mask is used to form a desired shape and pattern on the substrate, and is usually made of glass or metal. It is precisely aligned with the substrate using a series of manipulators. The Lamp Source is a UV source arranged in a linear arrangement, and provides pulses of radiation with a peak emission centered at a wavelength of 365nm. It is capable of operating in both normal and high-power operation modes. A wavelength monitor is used to ensure constant lamp intensity and uniformity of exposure across the substrate. The control unit is used to control the entire photolithography asset. USI UH 110 photoresist model provides an environment for production-standard photomasks. This equipment is specifically designed to print large area with consistent layer thickness and uniformity. The system is equipped with an advanced image processing unit, which ensures that the mask images are accurate and consistent. It also includes a powerful algorithm for automated defect detection and correction. The UFI supports a wide range of photoresists such as dry film, liquid film, epoxy, and silver-based photo resists. With its precise control and advanced imaging capabilities, the UFI can produce any number of microstructures with high accuracy and speed. ULTRON SYSTEMS INC UH 110 photoresist machine has several advantages over other photolithography systems. It has a fast image processing time due to its high frequency linear lamp sources and wavelength monitoring tool. Additionally, the UFI can handle a variety of substrates, including glass, metal, ceramic, and plastic. It has a low operating cost, as the lamp source requires no additional power supplies. In addition, the UFI offers a variety of image processing and control features including background subtraction, image scaling, mask alignment, defect and line width compensation, and more. This allows the user to quickly and accurately produce high-quality images.