Used ULTRON SYSTEMS INC / USI UH 110 #9394210 for sale

ULTRON SYSTEMS INC / USI UH 110 is a photoresist equipment designed for high-precision lithography applications. This system uses a proprietary lithography technology that combines a variety of advanced lithography techniques at various stages of the process. The photoresist unit can be used for lithographic processes such as deep-UV, near-UV, and vacuum-UV exposures, with high-resolution imaging capabilities for fine-pitch structures. The photoresist machine provides superior resolution, and is particularly suitable for advanced technologies such as micro-optics and MEMS fabrication, due to its excellent resolution, high contrast, and excellent etching characteristics. It has an improved performance over other photoresists, allowing for a higher resolution image and a wider process window. The tool provides three-dimensional structures, where features as small as 10-20nm can be created with high-precision. It has a very thin resist profile thickness, which can be precisely controlled, allowing for better control of profile shape and performance. It also has a high contrast resulting from its higher sensitivity to UV light, which is useful for creating realistic-looking features. USI UH 110 is designed to be compact, offering an integrated package of components to improve overall performance and reduce cost. In addition, the asset is highly customizable, allowing for easy integration into existing lithography systems for a customer's specific application. The model also has a high aspect ratio tolerance, allowing for better alignment of features and improved lithography performance. Furthermore, it is highly etch-resistant and has no banding or non-uniform patterning due to its thicker profile. It also has excellent resistance to common photoresist solvents. Overall, ULTRON SYSTEMS INC UH 110 is a high-performance photoresist equipment that offers excellent performance for lithography applications, such as micro-optics and MEMS fabrication. It is an ideal system for a range of lithography processes, due to its excellent resolution, high contrast, and excellent etching characteristics. It is also highly customizable and user-friendly to provide the best performance for customers' unique requirements.