Used ULTRON SYSTEMS INC / USI UH 114-8 #9299968 for sale

ULTRON SYSTEMS INC / USI UH 114-8 is a photoresist processing equipment that is designed to be used with high-resolution imaging needs in the development of photomasks, printing plates, and other imaging-related substrates. This system is equipped with several features that make it an ideal choice for those working in the fields of microelectronics, semiconductors, and optoelectronics. USI UH 114-8 is equipped with an array of automated instruments that provide precise imaging control and image transfer during photoresist processing. The unit is designed to provide a total atmospheric isolation from the environment, minimizing the risk of contamination. High precision electronic focusing ensures that the images created on the photomasks are accurately aligned and transferred. The machine includes a thermal sub-micron imaging projection tool to accommodate a wide range of image sizes, from 3 to 10 microns in size. The asset features a high-res vacuum exposure model for precise application of the photoresist layer on the substrate. A dedicated gas control equipment offers precise control over the levels of atmosphere pressure and gases during the resist processing process. This ensures consistent and reproducible photomasking results. Additionally, the machine offers an optical inspection module and a process parameter management system to ensure accuracy and repeatability of the imaging processes. ULTRON SYSTEMS INC UH 114-8 also features a Photomask Testing Station that can provide critical measurements, such as reflectivity and image contrast, to gauge the performance and image fidelity of the photomask. The unit can also be used for the processing of conventional and advanced dry photoresist materials. In addition to its array of automated instruments, UH 114-8 also offers a selection of optimized process recipes that can be tailored to meet the specific needs of the user's application. The advanced software also provides complete process control to ensure that photomasks and other imaging substrates are created and defined to exact standards and specifications. Overall, ULTRON SYSTEMS INC / USI UH 114-8 is an ideal machine for those in need of a high-resolution photoresist processing tool. It is packed with advanced features that enable the user to achieve precision results and repeatable imaging processes. It is also compatible with a wide selection of photomask materials and offers complete process control to ensure that the substrates are defined to exact specifications.