Used ULTRON SYSTEMS INC / USI UH 114 #293657345 for sale

ULTRON SYSTEMS INC / USI UH 114 is a high performance photoresist equipment designed to meet the needs of chipmakers, photoresist suppliers and foundries. The system provides superior image quality and uniformity, with precise control of exposure parameters and uniformity of resist layer thickness. It is equipped with advanced UV imaging technology, paired with a unique three-axis stage for precise overlay alignment. The unit is designed to enable ultra high resolution photolithography processes, with a resolution of up to 0.2 μm. It utilizes top-of-the-line LED imaging, providing superior linewidth resolution, with a wide dynamic range. The machine uses Pre-BAW technology to allow for faster exposure, faster solve of image artifacts, and larger exposure field than traditional binary mask aligner systems. The tool is also capable of supporting multiple operate recipes for different wafer sizes, allowing for flexibility for optimizing image quality and accelerating throughput. Its integrated imaging asset is capable of processing 8", 12", and 16" and 18" wafers. It is designed for high-volume production environment, with a very low failure rate, and significantly shorter align times. The model provides comprehensive process optimization for image quality, with automated edge-alignment, wafer stitching, and edge-to-edge uniformity. The equipment also provides the flexibility to easily adapt to new photoresist formulations, and process recipe requirements, enabling the support of different devices and technologies. The exposure system yields excellent results on challenging IC patterns, with excellent alignment and overlays and minimizes feature-width errors. The ergonomic design of the unit allows for easy operator access and easy adjustment of position and manipulation of wafers. Designed for industrial applications of the highest quality, USI UH 114 is the ideal choice for cost-effective yield improvement and value-added applications. The machine provides highly reliable lithography performance for applications such as mobile and high-end semiconductor IC devices, MEMS, and photo-mask production.