Used ULTRON SYSTEMS INC / USI UH 114 #293665652 for sale

ULTRON SYSTEMS INC / USI UH 114 is a photoresist equipment designed to provide the highest level of performance and quality for the semiconductor industry. The system offers an in-situ liquiddeveloper, which allows the user to develop a resist film without the need for stripping. This process reduces the number of steps required for processing, leading to improved productivity and yield. The photoresist unit also features a high-resolution photomasking machine that permits precise patterning of textures, along with a high-resolution laser pattern generator that is used for the masking and controlling of photoresist shapes. USI UH 114 photoresist tool also offers an integrated calibration process, allowing the user to adjust the focus and wavelength settings depending on the type of sample being processed. Each photomasking asset is tested to ensure that it meets stringent criteria in terms of resolution, sensitivity, and feature accuracy. The model also features an advanced image splicing function, allowing the user to construct unique patterns from multiple images in real time. The equipment's array of exposure tools allows the user to create high quality results on a range of different substrates. This includes substrates such as silicon wafers, plastic sheets, glass, metal, and ceramics. Each exposure tool has been designed to meet specific requirements, and the user can choose the most suitable one depending on the application. In addition, the system includes on-board calibration and process control routines, which ensure that all operations are executed precisely according to pre-defined settings. This reduces the risk of defects in semiconductor fabrication, and improves yield and reliability. Overall, ULTRA SYSTEMS INCULTRON SYSTEMS INC UH114 is a photoresist unit designed to deliver the most reliable and accurate results for the demanding requirements of the semiconductor industry. By providing efficient and automated operation, this machine ensures that costly defects are avoided, and that quality and yield are improved. In addition, it is well suited to a wide range of substrates, and offers an array of exposure tools that can handle the most complex applications.