Used ULTRON SYSTEMS INC / USI UH 114 #9294201 for sale

ULTRON SYSTEMS INC / USI UH 114 is a next generation, state-of-the-art photoresist equipment designed specifically for high throughput and high resolution applications. This system is optimized for ultra-high resolution imaging, with superior exposure accuracy and extremely low bake-and-peel time. USI UH 114's advanced photolithography technology provides superior process control for the most demanding of substrates, including the semiconductor industry's most challenging structures. The unit utilizes the latest technologies in advanced image-analysis software, allowing for more thorough image resolution, tight control of resolutions, and accurate inspection of existing structures to ensure exceptionally high print fidelity in the production process. ULTRON SYSTEMS INC UH114 utilizes a unique in-situ sensor, which provides real-time data on exposure level, substrate temperature, and substrate surface topology. This allows for precise process control and reduction of unwanted photoresist residues. The machine also includes a robust controller suite to ensure accurate alignment of the wafer to the image for maximum substrate coverage. The tool is configured to handle a wide range of photoresist thicknesses, allowing users to achieve the most accurate imaging, processing, and exposure time possible. ULTRON SYSTEMS INC UH 114 also features an integrated, ultra-high-resolution camera for greater imaging both during development and processing. UH114 photoresist asset also incorporates a highly accurate and efficient automatic exposure mechanism that eliminates manual variation of exposure settings. This eliminates human error in the process and allows users to achieve precise, uniform exposures throughout the entire photolithography and imaging process. This model also features a powerful, dynamic alignment equipment that ensures consistent images over the entire surface of each wafer. USI UH114 boasts an extremely low bake-and-peel time, providing greater throughput rates compared to traditional photoresist tools. The system also includes a number of advanced features such as high-speed scanning and repeatable data acquisition that guarantee that the best exposure time and optimum image quality are achieved. UH 114 photoresist unit offers a new level of precision in photolithography and imaging processes for the most challenging substrates. With its advanced photolithography technologies, efficient automatic exposure mechanism, powerful dynamic alignment machine, and ultra-high-resolution camera, the tool provides a reliable, high-throughput process for creating the most complex structures. Additionally, the asset's low bake-and-peel time makes it an ideal solution for projects with tight processing requirements.