Used ULTRON SYSTEMS INC / USI UH 130 #9096008 for sale

ULTRON SYSTEMS INC / USI UH 130 is a state-of-the-art photoresist equipment. This system is designed to provide the user with the highest levels of lithography features and ultra-high resolution imaging. The main component of the unit is the Novelon-TM Multi-Layer Resist and Machine Controller, which allow for precise adjustment of exposure levels, resolution and repeatability. This photoresist tool also features high-resolution optics and an imaging asset. The optics used include a high-NA optical column paired with an Ultra-High Resolution Mask that has a 1.2 micron pixel pitch and resolution that is higher than traditional optical lithography systems. The imaging model can display multiple resist layers simultaneously, allowing the user to create metal, semiconductor, or multilayer resist patterns with high accuracy. The imaging equipment is also integrated with a computer controlled motorized platform. This platform allows users to easily place, move and rotate the substrate, making it easier to obtain the desired alignment while preserving the integrity of the substrate. In addition to high-resolution optics and imaging, USI UH 130 also includes an advanced software program which provides automated exposure and sampling capabilities as well as a built-in library of pre-set exposure recipes. This program can be used to customize exposure sequences for a variety of materials and process requirements. ULTRON SYSTEMS INC UH 130 has a wide range of applications in the semiconductor and printed circuit board industries. This system can be used to create patterns such as via plugs, multi-layer resist features, high-aspect ratio holes, and high resolution line widths. Its versatile imaging unit allows for low overspray, making it highly suitable for printed circuit board production. In conclusion, UH 130 is an ideal choice for users looking for top-level lithography features and high-resolution imaging. The machine's advanced motorized platform, high-NA optics and automated exposure and sampling capabilities make it a reliable and highly accurate photoresist tool.