Used ULTRON UH 104 #9228783 for sale

ULTRON UH 104 is a photoresist equipment specifically designed for the fabrication of submicron integrated circuits. It offers enhanced imaging performance, enabling users to achieve high-resolution patterns for the most complex design applications. The system utilizes proprietary CNC technology for accuracy and ease of use. The device boasts an impressive feature set, including a 6-axis precision alignment unit, automatic material size adjustment, precise beam and firing power control, and non-contact loading. This combination of features helps to ensure precision and repeatability of the imaging process. The machine is constructed using a sophisticated, modular design, which simplifies maintenance and upgrades. It also includes a unique two in-bandage delivery machine for deposition of materials. The dual-belt design prevents material contamination, providing a highly reliable foundation for each layer of the photoresist tool. UH 104 also benefits from a self-compensating beam deflection asset for improved precision of pattern placement and alignment. The deflector includes a servo-servo-controlled liquid lens to ensure accurate and real-time pattern placement. Additionally, the model features a multi-target ribbon control equipment, which allows operators to manually adjust the exposure times and dose intensity of each ribbon. This advanced control feature ensures all photoresist layer thicknesses are ideal and consistent throughout the process. Furthermore, the system features a high vacuum series, which utilizes a gas-filled electrostatic chamber to create a more consistent vacuum environment for the photoresist unit. Using this chamber, the machine can achieve submicron feature size performance. Overall, ULTRON UH 104 is an advanced photoresist tool that is designed to provide users with highly accurate and repeatable patterns for the most complex design applications. The sophisticated design and feature set allow users to quickly and easily create precise patterns with minimal effort. The asset is ideal for fabricating submicron integrated circuits, as it provides users with an enhanced imaging performance and reliable accuracy.