Used UNIVERSAL PHOTONICS MS-61466 #293668925 for sale

UNIVERSAL PHOTONICS MS-61466 Photoresist Equipment is an advanced, highly efficient system for creating custom photoresist patterns and coatings. This unit can be used to create a variety of custom photoresists such as silica, polyimide, semi-conductor, and lithography-grade resists. MS-61466 machine is equipped with a Micro-Controlled Photoresist Coating & Application Device, two UV units that provide highly efficient exposure to wavelengths from 200-400nm, and two bake ovens. The device has two cameras that can be used to confirm the pattern of the photoresist. The tool is designed for the highest quality and accuracy in photolithography processes. It is capable of producing custom photoresists with dimensions ranging from 0.1μm to 100μm, as well as uniform resist lengths of 16mm x 16mm. UNIVERSAL PHOTONICS MS-61466's high precision makes it suitable for a variety of lithography applications, including patterning semiconductor components and fabricating circuits. The photoresist is applied using solventless, large area uniform application chemical dispense technique. Before the resist is applied, the substrate is treated with OPC and RCP cleaning processes to ensure a perfect foundation on which the coat can be placed. The high-precision application device ensures uniform photoresist thickness and patterns, with minimal spreading. The two UV units used in MS-61466 asset provide a long exposure time, up to 10 minutes, which allows for precise control over the patterning process. This model is designed for uniform resist panel production, as well as for custom resist patterns. Its high-accuracy baking oven ensures uniform and reliable curing of the photoresist. Overall, UNIVERSAL PHOTONICS MS-61466 Photoresist Equipment is an advanced and efficient solution for a variety of photolithography processes. It provides uniform and accurate coatings and patterns, as well as long exposure times to ensure precise control over the patterning process. It is a highly reliable system suitable for a range of lithography applications.