Used VERTEQ 1600-3 #9196056 for sale

VERTEQ 1600-3 is a state-of-the-art, three-beam photolithographic equipment for imaging a variety of resists. It features an advanced laser source, optical system, and sensitive optical detectors to ensure precise results. The unit delivers high throughput, high resolution, and high throughput accuracy when imaging variable resist thicknesses over large substrates. 1600-3 utilizes three distinct laser beams to allow for large area scans, with near-field optical detectors to ensure accurate results across a wide range of resist thicknesses. The laser sources are driven by robust control software capable of delivering high throughput performance. The optical systems feature patented NanoFeedback™ technology, which actively monitors imaging conditions in order to optimize accuracy and throughput. The built-in recipe-management machine allows for rapid recipe editing and calibration of process parameters. The tool is also highly modular and can be configured for production lithography applications. Various substrate management options are available for substrate handling, substrate seating, and substrate spacing control. In addition to imaging, VERTEQ 1600-3 asset is capable of three-dimensional mapping and imaging throughput of up to 25 wafers per hour. The model's unique design also allows for high-precision vacuum equipment automation, resulting in better adhesion and performance during imaging. Additionally, the system features an automated library of imaging recipes for easy retrieval and editing of existing recipes. Overall, 1600-3 photoresist unit provide reliable and accurate imaging for resists of varying thicknesses. The machine's robust design, versatile laser sources, and sensitive detectors make it an ideal choice for a range of photolithography applications, from multiplexing to masking and imaging.