Used VERTEQ 1600-33 #84724 for sale

VERTEQ 1600-33 is a state-of-the-art photoresist equipment designed for photoresist applications in the semiconductor industry. This advanced system is designed to provide superior results in both wafer imaging and development. Utilizing a high-powered light source with an integrated spatial filter and a variable frequency controller, 1600-33 offers excellent performance and maximum yield. Using its advanced high-resolution projection lens, VERTEQ 1600-33 provides unparalleled performance in wafer imaging. This unit is designed with precision alignment and tensioning capabilities, ensuring perfect parallelism between the mask and the substrate and allowing for maximum resolution. Additionally, its in-situ calibration features help ensure alignment accuracy over the course of long-term usage. In the development process, 1600-33 offers superior results due to its advanced patterns recognition machine. It utilizes advanced image recognition software to identify mask patterns, allowing for high-speed, high-accuracy development. Its unique swing-table mechanism allows for faster and more efficient wafer-tilt development, resulting in better coverage and higher yield. In terms of safety and convenience, VERTEQ 1600-33 is designed with a large number of user-friendly features. Its pass-through design ensures that personnel can quickly and safely maneuver around the tool. Its user-friendly software is designed to minimize operator training time, ensuring that operators can quickly begin work. It also offers timer control settings and maintenance records to ensure safety and accuracy. Overall, 1600-33 is a state-of-the-art photoresist asset designed for maximum performance and yield. Its high-powered light source and advanced image recognition software help ensure superior wafer imaging and development results. Furthermore, its numerous user-friendly features minimize training time and guarantee safe operation.