Used VERTEQ 1600-34 #9209715 for sale

VERTEQ 1600-34
Manufacturer
VERTEQ
Model
1600-34
ID: 9209715
Dual stack Spin Rinse Dryer (SRD).
VERTEQ 1600-34 Photoresist Equipment is a versatile and reliable system designed to meet specific imaging and development needs. The unit includes a motorized wafer stage and an integrated light source that allows for high resolution imaging and development capabilities. The machine has an advanced optical tool that provides a full 360-degree rotational range and a controllable exposure angle, which ensures a reliable, accurate and repeatable process. The motorized wafer stage allows for accurate and repeatable alignment and positioning of different sizes of wafers. The integrated light source emits a uniform light distribution and ensures that exposures are even across the entire surface of the wafer. 1600-34 Photoresist Asset is designed to be used with different types of photoresisists, including positive and negative materials, dry film and liquid resins. The model utilizes a dual rinse station, which allows two different types of photoresists to be run simultaneously. This feature also helps to reduce waste and contamination. The equipment includes an integrated cooling system that helps to prevent overheating of the light source, ensuring that the photoresists are not exposed to too much heat. The unit also features a built-in control machine, which allows for easy adjustment of exposure intensity and ensures a consistent processing of wafers. The tool is designed to be easy to operate and maintain, offering intuitive user-friendly controls and a comprehensive monitoring asset. The model comes with built-in performance monitoring, audit trails and error logs. Overall, VERTEQ 1600-34 Photoresist Equipment is a cost effective and reliable system that can meet the needs of a wide range of applications. With its advanced optics, motorized wafer stage and flexible exposure options, it is an ideal choice for those looking for a high quality unit for their photoresist processing needs.
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