Used VERTEQ 1600-34 #9238531 for sale

Manufacturer
VERTEQ
Model
1600-34
ID: 9238531
Wafer Size: 8"
Vintage: 1998
Spin Rinse Dryer (SRD), 8" 1998 vintage.
VERTEQ 1600-34 photoresist equipment is a next generation platform designed to deliver superior performance in the lithography market. It features a unique combination of technologies that allow it to accurately produce intricate parts with high precision. The system has three components: a maskless photomask alignment tool, a patamer illumination unit, and an advanced photoresist chemistry. The advanced maskless photomask alignment tool utilizes a patented tripod-supported optical machine that achieves unparalleled precision with an accuracy of 0.5 μm. The patamer illumination tool uses an array of laser light sources, allowing for exposure of a larger area with higher levels of uniformity. The advanced photoresist chemistry allows for highly accurate replication of complex patterns with a resist thickness down to 0.2 μm. 1600-34 is capable of producing intricate parts with resolutions as fine as 0.5 microns, going well beyond what the industry's standard 200nm minimum produces. It is also capable of a wide range of lithographic applications such as direct imaging, overlay alignment, and substrates patterning. VERTEQ 1600-34 offers cutting-edge, state-of-the-art technology that can handle any and all of the most demanding photolithography jobs. This innovative asset helps reduce time and costs associated with photomask alignment, patamer alignment, and lithography processing. With its range of features and capabilities, 1600-34 model is the ideal choice for high-precision lithography jobs.
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