Used VERTEQ 1600-44 #9398248 for sale

VERTEQ 1600-44 is a state of the art photoresist coating finishing equipment developed to meet the demand of modern photoresist technologies. This high performance system is used to create multi-layer thin-film photoresist structures with greater accuracy and sharpness than conventional photoresist processes. The upgradeable platform of 1600-44 uses dynamic high-speed imaging for quick and enhanced image processing. The device also allows for advanced exposure techniques such as exposure from the camera or from the resist layer. The unit is part of a two part process consisting of coating and imaging. The specialty of the machine is the multi-layer precision coating technology. This allows for thin-film photoresist layers to be accurately coated onto substrates such as wafers or glass. This allows for the creation of intricate patterns, including circuits and structure for MEMS and other electronic parts. The unit is designed to maintain a high degree of uniformity and consistency across each layer by using anodized dual magnetically levitated chambers and precision metering pumps. The imaging component of the tool is its most sophisticated feature. This is based on an advanced combination of high-speed cameras and sophisticated software algorithms. This allows the camera to detect and compensate for size and shape imperfections in the resist layer as well as identify any areas containing residual metals or other impurities. Once detected, the asset can adjust the exposure settings and concentrations to achieve the desired result for each layer. This means that each pattern that is created with the resist layer will be highly precise and repeatable. VERTEQ 1600-44 is an excellent choice for those requiring a high level of accuracy and uniformity in photoresist layers. It is a reliable and cost effective solution that offers users an upgradeable platform and consistently exceptional performance. With its combination of multi-layer precision coating technology, advanced imaging algorithms, and uniformity tolerances it is an ideal model for most photoresist applications.