Used VERTEQ 1600-55A #9124029 for sale

Manufacturer
VERTEQ
Model
1600-55A
ID: 9124029
Vintage: 1990
Spin Rinse Dryer (SRD) Left hinge door swing 120V, 60 Hz, 15A 1990 vintage.
VERTEQ 1600-55A is a photoresist equipment designed for use in semi-conductor manufacturing applications. It is a precision, bench mounted machine used to create thin films of resist that are applied to semiconductor wafers for photolithography processes. The system is equipped with a precision optical alignment unit and can be used to apply photoresist with high precision and repeatability. 1600-55A includes a 55A wafer loader that can accommodate 200mm, 150mm, or 100mm wafers up to 800µm thick. It has a rapid cycle time, and can make four wafer stops per second, enabling high-throughput production. The machine also features an external air cylinder driven by Step Motor / Drive and External Air Cylinder for wafer loading, driving, and positioning. The photoresist dispense tool includes three pumps (two for negative digitals and one for positive dispense) as well as a pressure regulator and mixing valve. It has a selection of programmable coating/masking functions such as step spreading and corner masking with Quick Change programmable functions. The asset is capable of high-precision, repeatable, and uniform application of resist onto the wafer. The photoresist model has a 1024 point linear encoder coupled with a direct digital control equipment which maintains accuracy and repeatability throughout the entire photomask change process. It is also equipped with an anti-static device for removing static charge, which prevents any damage to the coating film and the wafer. The machine is designed and manufactured to meet standard cleanroom requirements. It is also made from a combination of stainless steel and epoxy coating to ensure long-term resistance to acid and alkaline chemicals. In summary, VERTEQ 1600-55A photoresist system is a precision, bench mounted machine used to apply thin films of photoresist onto semiconductor wafers with high precision, repeatability, and uniformity. It is designed for use in semi-conductor manufacturing and includes a selection of programmable coating/masking features. It also meets standard cleanroom requirements and is made from durable materials.
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