Used VERTEQ 1600-55M #9000432 for sale

VERTEQ 1600-55M
Manufacturer
VERTEQ
Model
1600-55M
ID: 9000432
Wafer Size: 6"
Spin Rinse Dryer, 6".
VERTEQ 1600-55M photoresist equipment is a comprehensive, automated processing system designed for photolithography. The unit's versatility and performance are key advantages for a wide range of microelectronic applications. 1600-55M is notably adept at processing 4", 6", 8", and 12" (100, 150, 200, and 300mm) wafers. It offers unparalleled precision and accuracy, with an extraordinary level of uniformity and repeatability from wafer to wafer. The machine is powered by an advanced, user-friendly controller that offers sophisticated recipes customized to assign individual coverings of resist whenever needed. The controller is powerful enough for remote program execution, automating all the essential steps on the wafer and streamlining all processing functions. The user-friendly software is fully customizable to meet specific needs. Additionally, VERTEQ 1600-55M can be transported with a carriage, enabling it to be quickly moved into any type of tool, including traditional or batch-type processing environments with an autoloader. The asset's electromechanical platform assures reliable and durable operation of the components, offering precise positioning of the wafers on the track while minimizing true time exposure. Its reliable indexing assures exact registration of the coverings — even with the nested wafers — while maintaining consistent alignment of the different coverings. Its advanced temperature control features allow users to precisely adjust temperatures from 25°C to 90°C, where a uniform temperature is guaranteed over the entire wafer. Continuous temperature monitoring ensures precise and repeatable results. 1600-55M features the fastest crystallization temperatures in the industry; a maximum 30-second boil time with temperature ramping; and a maximum 65-second bake time. VERTEQ 1600-55M also offers a wide range of integrated smart features for fault detection and alignment, sample bar code control, tool optic performance monitoring, and advanced analytics. Its real-time damage prevention and defect detection features minimize faults and false detection. In all, 1600-55M is a powerful and versatile photoresist processing model perfect for a wide range of microelectronic applications. Its advanced controls, superior precision, accuracy, uniformity, repeatability, and fast crystallization and bake times make it the ideal solution for a variety of industries.
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