Used VERTEQ 1600-55M #9123196 for sale

VERTEQ 1600-55M is a high-precision photoresist processing equipment with a production rate of up to 55 wafer starts per hour. It is designed for both post-exposure bake (PEB) and programmed thermal processes in two independent cabinets. The system consists of two heated cabinets that can be used simultaneously, allowing enhanced wafer throughput and uniform process temperatures. It is capable of processing a wide variety of substrates and materials, such as silicon, polysilicon, indium phosphide, gallium arsenide, and other III-V compounds. The unit features multiple options for fast and accurate differentially pumped exposure. This includes an X-Y motion machine for accurate part alignment, an automatic programmable wafer loader, and an internal scanner tool for first-order aberrations and highlight stitching. A manual loading carrier is also included to enable sample-by-sample recipe control. The asset is supported by an intuitive graphical user interface (GUI) to ensure accuracy and repeatability of the processes. This includes parameter adjustment and recipe optimization tools. It can be easily integrated with other systems such as FOUP stockers for automated loading and unloading. 1600-55M also offers advanced process diagnostics capabilities with integrated process traceability, including second order aberration analysis. This is useful for maintaining process quality control. The model includes a remote support package with e-mail diagnostic messages for improved customer service. It is also designed for compatibility with most cleanrooms, making it ideal for a wide variety of applications. VERTEQ 1600-55M is a reliable photoresist processing equipment offering enhanced wafer throughput, accuracy, and repeatability over a wide variety of substrates and materials. Its intuitive GUI and advanced diagnostics capabilities make it a suitable choice for production applications in precision industries.