Used VERTEQ 1600-55M #9241900 for sale

VERTEQ 1600-55M photoresist equipment is a highly advanced system designed to produce high-quality and precise resists for etched components. It offers a range of features and capabilities that make it one of the most reliable and efficient systems available. 1600-55M is a dual electron beam written unit which combines two electron beams to precisely expose the photoresist on the substrate. This allows it to create patterns with excellent dimensional accuracy and outstanding throughput. The machine has a large individual vacuum chamber with a 55μm writing resolution making it great for producing intricate micro patterns. Its total automated control allows for a high degree of accuracy and precision. It also features a sophisticated optical tool and a high-resolution CCD camera. VERTEQ 1600-55M is designed to handle a wide range of substrates including polymers, metals, dielectrics, and semiconductors. It can expose a variety of features such as layers, lines, dots, circles, and slots. The asset is suitable for creating a variety of patterns such as thin film transistors, LEDs, flip-chip components, wiring, and contact holes. The model also features dual electron gun pulsing and rotating coils control. This ensures that patterns are exposed with excellent uniformity over the entire substrate, while the repeatability remains excellent within small areas. 1600-55M also features one of the most advanced substrate positioning systems on the market. Its triple CCD linear encoder ensures the substrate position is recorded accurately, while its pair of prismatic slides provide for efficient and repeatable motion. Ultimately, VERTEQ 1600-55M is an extremely advanced photoresist equipment for producing high-quality and efficient resists for etched components. Its high resolution, precision, and automated control make it one of the most reliable and versatile photoresist systems on the market.