Used VERTEQ 1600-55M #9241976 for sale

VERTEQ 1600-55M is a versatile and powerful exposure equipment for photoresists in microelectronic, nano-scale device lithography applications. This system provides a wide variety of features and capabilities for a range of applications, including photomask production, MEMS, semiconductor device fabrication, nanoscale patterning, and MEMS fabrication. 1600-55M utilizes a 6-inch chuck and a 55-mile Lithographers Resolution Field to ensure accurate and reliable results are obtained. The surface of the chuck is planarized for exceptional flatness, creating a uniform substrate to optimize uniformity and accuracy of pattern exposure. In addition, this unit is equipped with a high-precision X-Y stage which accurately positions and transfers the image across the substrate. This feature enables precise image registration for any given exposure and ensures that the photoresist is uniform. The machine also features an integrated light-beam positioner, allowing users to accurately align the image projector across the substrate. This allows for accurate mask alignment and provides users with the ability to match images easily from one wafer to another. The tool is powered by an innovative software package, which allows for automated storage, retrieval, and analysis of images. This package allows users to setup and operate the asset quickly and efficiently. VERTEQ 1600-55M utilizes a state-of-the-art and robust UV LED-Based Exposure Source, which is designed to provide the highest quality exposure results. This is a short-wavelength UV LED source with an emission of 254 nm, which is the best wavelength for exposing photoresists. This enables repeatability and stability of parameters for photoresist exposure, even at low doses. In addition, the model has two different lens assembly options: one for photomask applications or a core-less lens for sub-millimeter resolution. The core-less lens has a resolution capability of one-millimeter feature piece size and a swing angle of up to 45 degrees. All these features make 1600-55M ideal for a variety of photoresist applications.