Used VERTEQ 1600-55M #9245629 for sale

VERTEQ 1600-55M Photoresist Equipment is an advanced photolithography system for photoresist patterning on a variety of substrates. This unit is an optimal solution for exposure of large substrates, as well as exposing high-resolution patterns down to 10 μm. It features precise exposure uniformity and resolution with an LED-based light source that produces consistent illumination intensity over its 6-inch active scan area. It supports a broad range of wavelengths and filter only those photo diodes that match the desired wavelength and polarizer state of the mask image. It is compatible with a number of substrate materials, including germanium, silicon, gallium arsenide, and quartz. 1600-55M has five user-friendly operating modes—photoresist development mode, auto alignment mode, multiple exposures mode, and image adjustment mode—which make it easier for users to configure and calibrate the desired settings. The photoresist development mode prepares the substrate prior to patterning, and the auto alignment mode automatically aligns the substrate for accurate exposures. The multiple exposure mode supports concurrent exposures of different patterns on the same substrate. Additionally, the image adjustment mode provides finer-grained control over the patterning parameters. VERTEQ 1600-55M has a programmable precision scanning machine for providing pattern resolution down to 10 μm. It has programmable focus and plotting speed with fine-tuning knob for precise optical patterning. It is equipped with a high-resolution CCD camera for accurate definition of the mask images. 1600-55M also has a built-in mask library and a real-time auto-focus feature that enable users to quickly and easily set up the tool for each exposure. In addition, the asset is equipped with a leveling model to ensure that all masks are precisely parallel to the substrate. The equipment also has advanced safety features, such as a proximity sensor, to ensure that the scanned images do not drift or become blurry from vibration. Furthermore, the system has user-programmable formatting and a user-friendly control panel for ease of use and efficient operation. With its high resolution, precision exposure uniformity, wide range of capabilities, and user-friendly interfaces, VERTEQ 1600-55M Photoresist Unit provides users with an optimal solution for high-resolution, precise photolithography. This robust machine is an ideal choice for a variety of photoresist patterning applications.