Used VERTEQ 1600-55M #9253113 for sale

VERTEQ 1600-55M Photoresist Equipment is a modular platform designed to provide an optimized imaging solution for photoresist applications. This system addresses high-accuracy imaging needs of a variety of photoresist technologies. It is configured to utilize a wide range of photoresists, with single or dual transports, enabling processing of substrates up to 200 mm in size. The unit offers high throughput capability, excellent image quality, and can be easily integrated into a wide variety of process flows. 1600-55M is configurable with optical, reflective and transparent imaging components. Optical imaging is accomplished via three scanning optoelectronics sub-systems. The top optoelectronic is the single beam scanner, while the two side optoelectronics are multi-beam scanners. The scanning optoelectronics utilize high-powered optics, resulting in high-resolution imaging capabilities with low line spread function. A high resolution optical image magnification machine is also integrated into the tool for small area features. The reflective imaging subsystem is comprised of Laser Interferometric Magnification (LIM) optics, which enables imaging of planar and non-planar surfaces. The side optoelectronics, together with the LIM optics, provide imaging of stepped structures with high accuracy and throughput. Meanwhile, the transparent imaging subsystem enables contacting imaging with x-ray optics, providing excellent imaging results even for 3D structures. Additionally, VERTEQ 1600-55M is equipped with a wide range of imaging parameters, enabling optimal imaging for a variety of photoresist applications. These parameters include high accuracy alignment, exposure time optimization, dose calculation, and optical compensation. An intuitive user interface simplifies setting up the asset and selecting parameters, ensuring an efficient and optimal imaging process. Furthermore, the model is capable of handling multiple photoresist types with multiple processes, making it an ideal solution for various photoresist applications. Overall, 1600-55M Photoresist Equipment offers superior imaging capabilities and high throughput capability. With excellent image quality, highly configurable imaging parameters, and flexible integration with various process flows, the system is an ideal imaging solution for a variety of photoresist technologies.